Optimization of process condition to balance MEF and OPC for alternating PSM: control of forbidden pitches
- Author(s):
- Kim, K. ( Texas Instruments Inc. (USA) )
- Choi, Y.S.
- Socha, R.J. ( ASML (Netherlands) )
- Flagello, D.G.
- Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 240
- Page(to):
- 246
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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