Blank Cover Image

Optimization of process condition to balance MEF and OPC for alternating PSM: control of forbidden pitches

Author(s):
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part One
Page(from):
240
Page(to):
246
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Forbidden pitches for 130-nm lithography and below

Socha,R.J., Dusa,M.V., Capodieci,L., Finders,J., Chen,J.F., Flagello,D.G., Cummings,K.D.

SPIE - The International Society for Optical Engineering
7 Conference Proceedings Solutions for printing sub-100-nm contacts with ArF

Graeupner, P., Goehnermeier, A., Lowisch, M., Garreis, R.B., Flagello,D.G., Hansen, S.G., Socha, R.J., Koehler, C.

SPIE-The International Society for Optical Engineering
2 Conference Proceedings Understanding the forbidden pitch and assist feature placement

Shi,X., Hsu,S., Chen,F., Hsu,M., Socha,R.J., Dusa,M.V.

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20 [6349-36]

Huckabay, J., Staud, W., Naber, R., van Oosten, A., Nikolski, P., Hsu, S., Socha, R. J., Dusa, M. V., Flagello, D.

SPIE - The International Society of Optical Engineering
3 Conference Proceedings Understanding the forbidden pitch phenomenon and assist feature placement

Shi, X., Hsu, S., Chen, J.F., Hsu, M., Socha, R.J., Dusa, M.V.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Automatic pitch decomposition for improved process window when printing dense features at keff<0.20 [6283-102]

Huckabay, J., Staud, W., Naber, R., Dusa, M., Flagello, D., Socha, R.

SPIE - The International Society of Optical Engineering
4 Conference Proceedings Optical lithography in the sub-50-nm regime

Flagello, D.G., Arnold, B., Hansen, S., Dusa, M., Socha, R.J., Mulkens, J., Garreis, R.

SPIE - The International Society of Optical Engineering
10 Conference Proceedings Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology

Socha, R.J., Van Den Broeke, D.J., Yu, L., Conley, W., Wu, W., Chen, J.F., Petersen, J.S., Gerold, D.J., van Praagh, J., …

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process

Jeong, W.-G., Kim, D.-W., Park, C.-M., An, K.-W., Lee, D.-H., Kim, J.-M., Choi, S.-S., Jeong, S.H.

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Can DUV take us below 100 nm?

Finders,J., Jorritsma,L., Eurlings,M., Moerman,R., Greevenbroek,H.van, Schoot,J.B.van, Flagello,D.G., Socha,R.J., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Impact of coma on CD control for multiphase PSM designs

Schmidt,R.T., Spence,C.A., Capodieci,L., Krivokapic,Z., Geh,B., Flagello,D.G.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Through-pitch low-k1 contact hole imaging with CPL technology

Wiaux, V., Bekaert, J., Chen, J.F., Hsu, S.D., Ronse, K.G., Socha, R.J., Vandenberghe, G., Van Den Broeke, D.J.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12