Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL)
- Author(s):
Hsu, C. ( ASML MaskTools, Inc. (USA) ) Chu, R. ( Nanya Technology Corp. (Taiwan) ) Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. Shi, X. Hsu, S.D. Wang, T. ( Nanya Technology Corp. (Taiwan) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 76
- Page(to):
- 88
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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