Is model-based optical proximity correction ready for manufacturing? Study on 0.12- and 0.175-μm DRAM technology
- Author(s):
Cui, Y. ( IBM Microelectronics (USA) ) Zach, F.X. Butt, S. ( Infineon Technologies Corp. (USA) ) Li, W.-K. ( IBM Microelectronics (USA) ) Liegl, B. ( Infineon Technologies Corp. (USA) ) Liebmann, L.W. ( IBM Microelectronics (USA) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 67
- Page(to):
- 75
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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