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Flare and its impact on low-k1 KrF and ArF lithography

Author(s):
La Fontaine, B. ( Advanced Micro Devices, Inc. (USA) )
Dusa, M.V. ( ASML (USA) )
Acheta, A. ( Advanced Micro Devices, Inc. (USA) )
Chen, C.
Bourov, A. ( Motorola (USA) )
Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )
Litt, L.C. ( Motorola (USA) )
Mulder, M. ( ASML (Netherlands) )
Seltman, R. ( Advanced Micro Devices, Inc. (USA) )
van Praagh, J. ( ASML (Netherlands) )
5 more
Publication title:
Optical Microlithography XV
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4691
Pub. Year:
2002
Vol.:
Part One
Page(from):
44
Page(to):
56
Pages:
13
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
Language:
English
Call no.:
P63600/4691
Type:
Conference Proceedings

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