Flare and its impact on low-k1 KrF and ArF lithography
- Author(s):
La Fontaine, B. ( Advanced Micro Devices, Inc. (USA) ) Dusa, M.V. ( ASML (USA) ) Acheta, A. ( Advanced Micro Devices, Inc. (USA) ) Chen, C. Bourov, A. ( Motorola (USA) ) Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) ) Litt, L.C. ( Motorola (USA) ) Mulder, M. ( ASML (Netherlands) ) Seltman, R. ( Advanced Micro Devices, Inc. (USA) ) van Praagh, J. ( ASML (Netherlands) ) - Publication title:
- Optical Microlithography XV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4691
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 44
- Page(to):
- 56
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- Language:
- English
- Call no.:
- P63600/4691
- Type:
- Conference Proceedings
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