Fullerene incorporation in DNQ Novolak photoresist for increasing plasma etch resistance
- Author(s):
- Benson, J.D. ( U.S. Army Night Vision & Electronic Sensors Directorate )
- Stoltz, A.J., Jr.
- Kaleczyc, A.W.
- Dinan, J.H.
- Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1224
- Page(to):
- 1227
- Pages:
- 4
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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