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Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.

Author(s):
Hwang, Y.-S. ( Hynix Semiconductor, Inc. (Korea) )
Jung, J.-C.
Park, K.-D.
Lee, S.-K.
Kim, J.-S.
Kong, K.-K.
Shin, K.-S.
Ding, S.-J. ( Clariant Corp. (USA) )
Xiang, Z.
Neisser, M.
5 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part Two
Page(from):
1119
Page(to):
1125
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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