Characterization and improvement of resist pattern collapse on ArF (193 nm) organic B.A.R.C.
- Author(s):
Hwang, Y.-S. ( Hynix Semiconductor, Inc. (Korea) ) Jung, J.-C. Park, K.-D. Lee, S.-K. Kim, J.-S. Kong, K.-K. Shin, K.-S. Ding, S.-J. ( Clariant Corp. (USA) ) Xiang, Z. Neisser, M. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 1119
- Page(to):
- 1125
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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