Blank Cover Image

Parameter extraction for 157-nm photoresists

Author(s):
Bendik, J.J. ( Dynamic Intelligence, Inc. (USA) )
Conley, W. ( International SEMATECH (USA) )
Miller, D.A.
Zimmerman, P.
Dean, K.R.
Petersen, J.S. ( Peyersen Advanced Lithography, Inc. (USA) )
Byers, J. ( KLA-Tencor (USA) )
2 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part Two
Page(from):
988
Page(to):
996
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

Similar Items:

1 Conference Proceedings Perfect photoresist for 157-nm imaging

Conley,W., Byers,J.D., Dean,K.R., Hansen,S.G., Finders,J., Sinkwitz,S.

SPIE-The International Society for Optical Engineering
7 Conference Proceedings Polymers for 157-nm photoresist applications:a progress report

Patterson,K., Yamachika,M., Hung,R., Brodsky,C.J., Yamada,S., Somervell,M.H., Osborn,B., Hall,D., Dukovic,G., …

SPIE - The International Society for Optical Engineering
2 Conference Proceedings Negative photoresist for 157-nm microlithography: a progress report

Conley, W., Trinque, B.C., Miller, D., Caporale, S., Osborn, B.P., Kumamoto, S., Pinnow, M.J., Callahan, R., Chambers, …

SPIE-The International Society for Optical Engineering
8 Conference Proceedings Advances in resists for 157-nm microlithography

Trinque, B.C., Osborn, B.P., Chambers, C.R., Hsieh, Y.-T., Corry, S.B., Chiba, T., Hung, R.J., Tran, H.V., Zimmerman, …

SPIE-The International Society for Optical Engineering
3 Conference Proceedings Photoresist outgassing at 157-nm exposure

Hien,S., Angood,S., Ashworth,D., Basset,S., Bloomstein,T.M., Dean,K.R., Kunz,R.R., Miller,D.A., Patel,S., Rich,G.K.

SPIE-The International Society for Optical Engineering
9 Conference Proceedings Highly transparent resist platforms for 157-nm microlithography: an update

Vohra, V.R., Douki, K., Kwark, Y.-J., Liu, X.-Q., Ober, C.K., Bae, Y.C., Conley, W., Miller, D., Zimmerman, P.

SPIE-The International Society for Optical Engineering
4 Conference Proceedings Negative photoresist for 157-nm microlithography: a progress report

Conley, W., Trinque, B.C., Miller, D.A., Zimmerman, P., Kudo, T., Dammel, R.R., Romano, A.R., Willson, C.G.

SPIE-The International Society for Optical Engineering
10 Conference Proceedings Dissolution inhibitors for 157-nm microlithography

Conley, W., Miller, D.A., Chambers, C.R., Osborn, B.P., Hung, R.J., Tran, H.V., Trinque, B.C., Pinnow, M.J., Chiba, T., …

SPIE-The International Society for Optical Engineering
5 Conference Proceedings Aberration determination in early 157-nm exposure system

Smith, B.W., Conley, W., Garza, C.M., Meute, J., Miller, D.A., Rich, G.K., Graffenberg, V., Dean, K.R., Patel, S., Ford, …

SPIE-The International Society for Optical Engineering
11 Conference Proceedings Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report

Sharif, I., DesMarteau, D., Ford, L., Shafer, G.J., Thomas, B., Conley, W., Zimmerman, P., Miller, D., Lee, G.S., …

SPIE-The International Society for Optical Engineering
6 Conference Proceedings Fluoropolymer resists for 157 nm lithography

Vohra, V.R., Liu, X.-Q., Douki, K., Ober, C.K., Conley, W., Zimmerman, P., Miller, D.

SPIE-The International Society for Optical Engineering
12 Conference Proceedings Correction of 157-nm lens based on phase ring aberration extraction method

Meute, J., Rich, G.K., Conley, W., Smith, B.W., Zavyalova, L.V., Cashmore, J.S., Ashworth, D., Webb, J.E., Rich, L.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12