Novel molecular resists based on inclusion complex of cyclodextrin
- Author(s):
- Kim, J.-B. ( Korea Advanced Institute of Science and Technology )
- Kwon, Y.-G.
- Yun, H.-J.
- Choi, J.-H.
- Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 837
- Page(to):
- 845
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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