Novel approach for high resolution using cycloolefin-alt-maleic acid derivatives polymer for ArF lithography
- Author(s):
Lee, J.-B. ( Korea Kumho Petrochemical Co., Ltd. ) Park, J.-H. Seo, D.-C. Kim, C.-M. Lim, Y.-T. Cho, S.-D. Joo, H.-S. Jeon, H.-P. Kim, S.-J. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 623
- Page(to):
- 630
- Pages:
- 8
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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