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E-beam curing effects on the etch and CD-SEM stability of 193-nm resists

Author(s):
Padmanaban, M. ( Clariant Corp. (USA) )
Alemy, E.
Dammel, R.R.
Kim, W.-K.
Kudo, T.
Lee, S.-H.
McKenzie, D.S.
Orsi, A.
Rahman, D.
Chen, W.-L. ( Lam Research Corp. (USA) )
Sadjadi, R.M.
Livesay, W.R. ( Electron Vision Corp. (USA) )
Ross, M.F.
8 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part One
Page(from):
606
Page(to):
614
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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