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Implementation of the ArF resists based on VEMA for sub-100-nm device

Author(s):
Kim, H.-W. ( Samsung Electronics Co., Ltd. (Korea) )
Lee, S.
Choi, S.-J.
Lee, S.-H.
Kang, Y.
Woo, S.-G.
Nam, D.S.
Chae, Y.-S.
Kim, J.S.
Moon, J.-T.
Kavanagh, R.J. ( Shipley Co. LLC (USA) )
Barclay, G.G.
7 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part One
Page(from):
533
Page(to):
540
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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