Applicaton of blends and side chain Si-O copolymers as high-etch resistant sub-100-nm E-beam resists
- Author(s):
Huang, W.-S. ( IBM Microelectronics Div. (USA) ) Kwong, R.W. Moreau, W.M. Lang, R. Medeiros, D.R. ( IBM Thomas J. Watson Research Ctr. (USA) ) Petrillo, K.E. Mahorowala, A.P. Angelopoulos, M. Lin, Q. Dai, J. ( Cornell Univ. (USA) ) Ober, C.K. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 432
- Page(to):
- 441
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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