Evolution of a 193-nm bilayer resist for manufacturing
- Author(s):
Kwong, R.W. ( IBM Microelectronics Div. (USA) ) Khojasteh, M. Lawson, P. Hughes, T. Varanasi, P.R. Brunsvold, B. Allen, R.D. ( IBM Almaden Research Ctr. (USA) ) Brock, P.J. Sooriyakumaran, R. Truong, H.D. Mahorowala, A.P. ( IBM Thomas J. Watson Research Ctr. (USA) ) Medeiros, D.R. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 403
- Page(to):
- 409
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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