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Evolution of a 193-nm bilayer resist for manufacturing

Author(s):
Kwong, R.W. ( IBM Microelectronics Div. (USA) )
Khojasteh, M.
Lawson, P.
Hughes, T.
Varanasi, P.R.
Brunsvold, B.
Allen, R.D. ( IBM Almaden Research Ctr. (USA) )
Brock, P.J.
Sooriyakumaran, R.
Truong, H.D.
Mahorowala, A.P. ( IBM Thomas J. Watson Research Ctr. (USA) )
Medeiros, D.R.
7 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. date:
2002
Vol.:
Part One
Page(from):
403
Page(to):
409
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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