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Amine gradient process for 157-nm lithography

Author(s):
Jung, J.-C. ( Hynix Semiconductor, Inc. (Korea) )
Kong, K.-K.
Hwang, Y.-S.
Park, K.-D.
Lee, S.-K.
Lee, G.S.
Kim, J.S.
Shin, K.-S.
3 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part One
Page(from):
212
Page(to):
220
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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