Characterization and acid diffusion measurements of new strong acid photoacid generators

Characterization and acid diffusion measurements of new strong acid photoacid generators

Author(s):

Wallraff, G.M. ( IBM Almaden Research Ctr. (USA) )

Lamanna, W.M. ( 3M Co. (USA) )

Parent, M.J.

Robeledo, T. ( San Jose State Univ. (USA) )

Young, G.L.

5 more

Publication title:

Advances in Resist Technology and Processing XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4690

Pub. Year:

2002

Vol.:

Part One

Page(from):

160

Page(to):

168

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

Language:

English

Call no.:

P63600/4690

Type:

Conference Proceedings

Details

TDL ID:	ZA00012523
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2002 : 19th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.04-2002.03.06

Similar Items:

1 Conference Proceedings New ionic photo-acid generators (PAGs) incorporating novel perfluorinated anions Lamanna, W.M., Kessel, C.R., Savu, P.M., Cheburkov, Y., Brinduse, S., Kestner, T.A., Lillquist, G.J., Parent, M.J., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Photoacid generation in chemically amplified resists: elucidation of structural effects of photoacid generators using new acid-sensitive dyes for monitoring … Cameron,J.F., Mori,J.M., Zydowsky,T.M., Kang,D., Sinta,R.F., King,M., Scaiano,J.C., Pohlers,G., Virdee,S., Connolly,T. SPIE-The International Society for Optical Engineering
2 Conference Proceedings Combinitorial resist processing studies Larson, C.E., Wallraff, G.M. SPIE - The International Society of Optical Engineering	8 Conference Proceedings Experimental method for quantifying acid diffusion in chemically amplified resists Wallraff, G. M., Hinsberg, W. D., Houle, F. A., Morrison, M. D., Larson, C. E., Sanchez, M, I., Hoffnagle, J. A., Brock, … SPIE - The International Society of Optical Engineering
3 Conference Proceedings Optimized acid release underlayers for 157-nm lithography Larson, C.E., Wallraff, G.M., Johnson, L., Brock, P.J., Sundberg, L.K. SPIE - The International Society of Optical Engineering	9 Conference Proceedings Effect of resist components on image spreading during postexposure bake of chemically amplified resists Hinsberg,W.D., Houle,F.A., Sanchez,M.I., Morrison,M.E., Wallraff,G.M., Larson,C.E., Hoffnagle,J.A., Brock,P.J., … SPIE - The International Society for Optical Engineering
4 Conference Proceedings Liquid immersion lithography: evaluation of resist issues Hinsberg, W., Wallraff, G.M., Larson, C.E., Davis, B.W., Deline, V., Raoux, S., Miller, D., Houle, F.A., Hoffnagle, J., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings Novel nonionic photoacid generator releasing strong acid for chemically amplified resists Yamato, H., Asakura, T., Hintermann, T., Ohwa, M. SPIE - The International Society of Optical Engineering
5 Conference Proceedings Characterization of new aromatic polymers for 157-nm photoresist applications Fender,N., Brock,P.J., Chau,W., Bangsaruntip,S., Mahorowala,A.P., Wallraff,G.M., Hinsberg,W.D., Larson,C.E., Ito,H., … SPIE-The International Society for Optical Engineering	11 Conference Proceedings Diffusion and distribution of photoacid generators in thin polymer films Lin, Qinghuang, Angelopoulos, Marie, Babich, Katherina, Medeiros, David, Sundararajan, Narayan, Weibel, Gina, Ober, … MRS-Materials Research Society
6 Conference Proceedings Extendibility of chemically amplified resists: another brick wall? (Invited Paper) Hinsberg, W.D., Houle, F.A., Sanchez, M.I., Hoffnagle, J.A., Wallraff, G.M., Medeiros, D.R., Gallatin, G.M., Cobb, J.L. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Effect of humidity on deprotection kinetics in chemically amplified resists Burns, S.D., Medeiros, D.R., Johnson, H.F., Wallraff, G.M., Hinsberg, W.D., Willson, C.G. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12