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Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists

Author(s):
Kudo, T. ( Clariant Corp. (USA) )
Alemy, E.L.
Dammel, R.R.
Kim, W.-K.
Lee, S.-H.
Masuda, S.
McKenzie, D.S.
Rahman, M.D.
Romano, A.R.
Padmanaban, M.
Chun, J.-S. ( Cypress Semiconductor Corp. (USA) )
Jung, J.-C. ( Hynix Semiconductor, Inc. (Korea) )
Lee, S.-K.
Shin, K.-S.
Kim, H.-S.
10 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. date:
2002
Vol.:
Part One
Page(from):
150
Page(to):
159
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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