Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers

Investigation of lithographic performance for 120-nm and sub-120-nm gate applications of advanced ArF resists based on VEMA co-polymers

Author(s):

Kavanagh, R.J. ( Shipley Co. LLC (USA) )

Mortini, B.P. ( STMicroelectronics (France) )

3 more

Publication title:

Advances in Resist Technology and Processing XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4690

Pub. Year:

2002

Vol.:

Part One

Page(from):

141

Page(to):

149

Pages:

9

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

Language:

English

Call no.:

P63600/4690

Type:

Conference Proceedings

Details

TDL ID:	ZA00012523
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2002 : 19th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.04-2002.03.06

Similar Items:

1 Conference Proceedings Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone Tanaka,T., Choi,S.-J., Jung,D.-W., Lee,S., Lee,S.-H., Kang,Y., Woo,S.-G., Moon,J.-T., Kavanagh,R.J., Barclay,G.G., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Influence of backbone chemistry on the post-exposure bake temperature sensitivity of 193-nm photoresists Bae, Y.C., Ogawa, T., Kavanagh, R.J., Kobayashi, T., Lindsay, T., Tanaka, T., Xu, C.B., Orsula, G., DeSisto, J., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Implementation of the ArF resists based on VEMA for sub-100-nm device Kim, H.-W., Lee, S., Choi, S.-J., Lee, S.-H., Kang, Y., Woo, S.-G., Nam, D.S., Chae, Y.-S., Kim, J.S., Moon, J.-T., … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Evaluating resist degradation during reactive ion oxide etching using 193 nm model resist formulations [6153-25] May, M J, Mortini, B, Sourd, C, Perret, D, Chung, D W, Barclay, G, Brochon, C, Hadziioannou, G SPIE - The International Society of Optical Engineering
3 Conference Proceedings Mechanistic understanding of post-etch roughness in 193-nm photoresists Bae, Y.C., Barclay, G.G., Bolton, P.J., Kavanagh, R.J., Bu, L., Kobayashi, T., Adams, T., Pugliano, N., Thackeray, J.W. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Negative tone 193-nm photoresists Pugliano, N., Bolton, P.J., Barbieri, T., King, M., Reilly, M.T., Lawrence, W., Kang, D., Barclay, G.G. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Design and performance of photoresist materials for ArF lithography Kim,H.-W., Jung,D.-W., Lee,S., Choi,S.-J., Woo,S.-G., Kavanagh,R.J., Barclay,G.G., Blacksmith,R.F., Kang,D., Pohlers,G., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Thick-film positive DUV photoresist for implant layer application Mori,M., Thackeray,J.W., Xu,C.B., Orsula,G.W., Prettyman,E., Bell,R., Routh,R.M. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Methods to achieve sub-100-nm contact hole lithography Lindsay, T.K., Kavanagh, R.J., Pohlers, G., Kanno, T., Bae, Y.C., Barclay, G.G., Kanagasabapathy, S., Mattia, J. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Comparison of ArF bilayer resists for sub-90 nm L/S fabrication Hong, J., Kim, H.-W., Lee, S.-H., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Practical resists for 193-nm lithography using 2.38% TMAH:physicochemical influences on resist performance Szmanda,C.R., Yu,J., Barclay,G.G., Cameron,J.F., Kavanagh,R.J., Blacksmith,R.F., III,P.Trefonas, Taylor,G.N. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Novel high-performance ArF resist for sub-100-nm lithography Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12