Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)

Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)

Author(s):

Lee, G. ( Hyundai Electronics Industries Co., Ltd. (Korea) )

Kong, K.-K.

Jung, J.-C.

Shin, K.-S.

Kang, J.-H. ( DongJin Semichem Co., Ltd. (Korea) )

Publication title:

Advances in Resist Technology and Processing XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4690

Pub. Year:

2002

Vol.:

Part One

Page(from):

136

Page(to):

140

Pages:

5

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

Language:

English

Call no.:

P63600/4690

Type:

Conference Proceedings

Details

TDL ID:	ZA00012523
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2002 : 19th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.04-2002.03.06

Similar Items:

1 Conference Proceedings Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs Choi,S.-J., Choi,Y.-J., Kim,Y.-S., Kim,S.-D., Kim,D.-B., Kim,J.-H., Koh,C.-W., Lee,G., Jung,J.-C., Baik,K.-H. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Ring opened maleic anhydride and norbornene copolymers (ROMA) have a good character in resist flow process for 193-nm resist technology Joo, H.-S., Seo, D.C., Kim, C.M., Lim, Y.T., Cho, S.D., Lee, J.B., Jeon, H.P., Park, J.H., Jung, J.C., Shin, K.S., Bok, … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Design and properties of new deep-UV positive photoresist Choi,S.-J., Jung,S.-Y., Kim,C.-H., Park,C.-G., Han,W.-S., Koh,Y.-B., Lee,M.-Y. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Novel routes toward sub-70-nm contact windows by using new KrF photoresist Kim,J.-S., Koh,C.-W., Lee,G., Jung,J.-C., Shin,K.-S. SPIE-The International Society for Optical Engineering
3 Conference Proceedings High-performance 193-nm photoresist materials based on ROMA polymers: sub-90-nm contact hole application with resist reflow Joo, H.S., Seo, D.C., Kim, C.M., Lim, Y.T., Cho, S.D., Lee, J.B., Song, J.Y., Kim, K.M., Park, J.H., Jung, J.C., Shin, … SPIE - The International Society of Optical Engineering	9 Conference Proceedings Investigation of the effect of resist components and process condition on photochemical efficiency of ArF photoresist Kim, J.-W., Son, E.-K., Lee, S.-H., Kim, D., Kim, J., Lee, G., Jung, J.C., Bok, C.K., Moon, S.C., Shin, K.S. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Novel high-performance ArF resist for sub-100-nm lithography Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings ArF photoresist containing novel acid labile cross-linker for high contrast and PED stability Lee,G., Koh,C.-W., Hong,S.-E., Jung,J.-C., Jung,M.-H., Kim,H.-S., Baik,K.-H. SPIE - The International Society for Optical Engineering
5 Conference Proceedings Novel 193-nm photoresist based on Olefin-containing lactones Yoon,K.-S., Jung,D.-W., Lee,S., Lee,S.-H., Choi,S.-J., Woo,S.-G., Moon,J.-T. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Design and performance of photoresist materials for ArF lithography Kim,H.-W., Jung,D.-W., Lee,S., Choi,S.-J., Woo,S.-G., Kavanagh,R.J., Barclay,G.G., Blacksmith,R.F., Kang,D., Pohlers,G., … SPIE-The International Society for Optical Engineering
6 Conference Proceedings Novel 193-nm single-layer resist containing a multifunctional monomer Lee, G., Koh, C. -W., Jung, J. -C., Jung, M. -H., Kim, H. -S., Baik, K. -H., Choi, I. -H. SPIE - The International Society of Optical Engineering	12 Conference Proceedings New approach for 193-nm resist using modified cycloolefin resin Park, J.H., Seo, D.C., Kim, C.-M., Lim, Y.-T., Cho, S.-D., Lee, J.B., Joo,H.-S., Jeon, H.-P., Kim, S.-J., Jung, J.-C., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12