High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate
- Author(s):
Rahman, M.D. ( Clariant Corp. (USA) ) Alemy, E. Conley, W. ( International SEMATECH (USA) ) Miller, D. Dammel, R.R. ( Clariant Corp. (USA) ) Kim, W.-K. Kudo, T. Lee, S.-H. Masuda, S. McKenzie, D.S. Padmanaban, M. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 127
- Page(to):
- 135
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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