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High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate

Author(s):
Rahman, M.D. ( Clariant Corp. (USA) )
Alemy, E.
Conley, W. ( International SEMATECH (USA) )
Miller, D.
Dammel, R.R. ( Clariant Corp. (USA) )
Kim, W.-K.
Kudo, T.
Lee, S.-H.
Masuda, S.
McKenzie, D.S.
Padmanaban, M.
6 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. date:
2002
Vol.:
Part One
Page(from):
127
Page(to):
135
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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