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New approach for 193-nm resist using modified cycloolefin resin

Author(s):
Park, J.H. ( Korea Kumho Petrochemical Co., Ltd. (Korea) )
Seo, D.C.
Kim, C.-M.
Lim, Y.-T.
Cho, S.-D.
Lee, J.B.
Joo,H.-S.
Jeon, H.-P.
Kim, S.-J.
Jung, J.-C. ( Hynix Semiconductor, Inc. (Korea) )
Shin, K.-S.
Kong, K.K.
Yamada, T. ( Nagase ChemteX Corp. (Japan) )
8 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. date:
2002
Vol.:
Part One
Page(from):
120
Page(to):
126
Pages:
7
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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