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Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography

Author(s):
Dammel, R.R. ( Clariant Corp. (USA) )
Sakamuri, R.
Lee, S.-H.
Rahman, M.D.
Kudo, T.
Romano, A.R.
Rhodes, L.F. ( Promerus Corp. (USA) )
Lipian, J.
Hacker, C.
Barnes, D.A.
5 more
Publication title:
Advances in Resist Technology and Processing XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4690
Pub. Year:
2002
Vol.:
Part One
Page(from):
101
Page(to):
109
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444363 [0819444367]
Language:
English
Call no.:
P63600/4690
Type:
Conference Proceedings

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