Cycloolefin/cyanoacrylate (COCA) copolymers for 193-nm and 157-nm lithography
- Author(s):
Dammel, R.R. ( Clariant Corp. (USA) ) Sakamuri, R. Lee, S.-H. Rahman, M.D. Kudo, T. Romano, A.R. Rhodes, L.F. ( Promerus Corp. (USA) ) Lipian, J. Hacker, C. Barnes, D.A. - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 101
- Page(to):
- 109
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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