Highly transparent resist platforms for 157-nm microlithography: an update

Highly transparent resist platforms for 157-nm microlithography: an update

Author(s):

Vohra, V.R. ( Cornell Univ. (USA) )

Bae, Y.C. ( Shipley Co. LLC (USA) )

Conley, W. ( International SEMATECH (USA) )

Miller, D.

Zimmerman, P.

4 more

Publication title:

Advances in Resist Technology and Processing XIX

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4690

Pub. Year:

2002

Vol.:

Part One

Page(from):

84

Page(to):

93

Pages:

10

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

Language:

English

Call no.:

P63600/4690

Type:

Conference Proceedings

Details

TDL ID:	ZA00012523
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Advances in resist technology and processing
Conf. info. (Number):	2002 : 19th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.04-2002.03.06

Similar Items:

1 Conference Proceedings Fluoropolymer resists for 157 nm lithography Vohra, V.R., Liu, X.-Q., Douki, K., Ober, C.K., Conley, W., Zimmerman, P., Miller, D. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Negative photoresist for 157-nm microlithography: a progress report Conley, W., Trinque, B.C., Miller, D., Caporale, S., Osborn, B.P., Kumamoto, S., Pinnow, M.J., Callahan, R., Chambers, … SPIE-The International Society for Optical Engineering
2 Conference Proceedings Advances in resists for 157-nm microlithography Trinque, B.C., Osborn, B.P., Chambers, C.R., Hsieh, Y.-T., Corry, S.B., Chiba, T., Hung, R.J., Tran, H.V., Zimmerman, … SPIE-The International Society for Optical Engineering	8 Conference Proceedings Design strategies for 157-nm single-layer photoresists lithographic evaluation of a poly(α-trifluoromethyl vinyl alcohol)copolymer Schmaljohann,D., Bae,Y.C., Weibel,G.L., Hamad,A.H., Ober,C.K. SPIE - The International Society for Optical Engineering
3 Conference Proceedings Fluorinated dissolution inhibitors for 157-nm lithography Hamad, A.H., Bae, Y.C., Liu, X.-Q., Ober, C.K., Houlihan, F.M., Dabbagh, G., Novembre, A.E. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Hexafluoroisopropyl and trifluoromethyl carbinols in an acrylate platform for 157-nm chemically amplified resists Jakubek, V., III, E.A.R., Abdourazak, A.H., Markley, T.J., Marsella, J.A., Ober, C.K. SPIE - The International Society of Optical Engineering
4 Conference Proceedings Resist materials for 157-nm microlithography: an update Willson,C.G., Tran,H.V., Trinque,B.C., Chiba,T., Yamada,S., Sanders,D.P., Connor,E.F., Grubbs,R.H., Klopp,J.M., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings Transparent resins for 157-nm lithography Dammel,R.R., Sakamuri,R., Romano,A.R., Vicari,R., Hacker,C., Conley,W., Miller,D.A. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Negative photoresist for 157-nm microlithography: a progress report Conley, W., Trinque, B.C., Miller, D.A., Zimmerman, P., Kudo, T., Dammel, R.R., Romano, A.R., Willson, C.G. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Parameter extraction for 157-nm photoresists Bendik, J.J., Conley, W., Miller, D.A., Zimmerman, P., Dean, K.R., Petersen, J.S., Byers, J. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Dissolution inhibitors for 157-nm microlithography Conley, W., Miller, D.A., Chambers, C.R., Osborn, B.P., Hung, R.J., Tran, H.V., Trinque, B.C., Pinnow, M.J., Chiba, T., … SPIE-The International Society for Optical Engineering	12 Conference Proceedings Baking study of fluorinated 157-nm resist Houlihan, F.M., Sakamuri, R., Romano, A.R., Dammel, R.R., Conley, W., Rich, G.K., Miller, D., Rhodes, L.F., McDaniels, … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12