Dissolution inhibitors for 157-nm microlithography
- Author(s):
Conley, W. ( International SEMATECH (USA) ) Miller, D.A. Chambers, C.R. ( Univ. of Texas at Austin (USA) ) Osborn, B.P. Hung, R.J. Tran, H.V. Trinque, B.C. Pinnow, M.J. Chiba, T. McDonald, S. Zimmerman, P. ( International SEMATECH (USA) ) Dammel, R.R. ( Clariant Corp. (USA) ) Romano, A.R. Willson, C.G. ( Univ. of Texas at Austin (USA) ) - Publication title:
- Advances in Resist Technology and Processing XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4690
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 69
- Page(to):
- 75
- Pages:
- 7
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- Language:
- English
- Call no.:
- P63600/4690
- Type:
- Conference Proceedings
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