Effect of various ArF resist shrinkage amplitudes on CD bias
- Author(s):
Ke, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. ) Gau, T.-S. Chen, P.-H. Yen, A. Lin, B.J. Otaka, T. ( Hitachi High-Technologies Corp. (Japan) ) Iizumi, T. Sasada, K. Ueda, K. - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4689
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 997
- Page(to):
- 1006
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- Language:
- English
- Call no.:
- P63600/4689
- Type:
- Conference Proceedings
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