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Proximity effect correction optimization considering fogging and loading effects compensation

Author(s):
Yang, S.-H. ( Samsung Electronics Co., Ltd. (Korea) )
Choi, Y.-H.
Park, J.-R.
Kim, Y.H.
Choi, S.-W.
Sohn, J.-M.
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4689
Pub. Year:
2002
Vol.:
Part Two
Page(from):
977
Page(to):
984
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
Language:
English
Call no.:
P63600/4689
Type:
Conference Proceedings

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