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Line-profile and critical-dimension correlation between a normal-incidence optical CD metrology system and SEM

Author(s):
Yang, W. ( Nanometrics Inc. (USA) )
Lowe-Webb, R.
Korlahalli, R.
Zhuang, V.G.
Sasano, H. ( Applied Materials, Inc. (USA) )
Liu, W.
Mui, D.
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4689
Pub. date:
2002
Vol.:
Part Two
Page(from):
966
Page(to):
976
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
Language:
English
Call no.:
P63600/4689
Type:
Conference Proceedings

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