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Improved characteristics of rainbow defects with novel wafer edge exposure technique

Author(s):
Shim, K.-C. ( Hynix Semiconductor Inc. (Korea) )
Kim, M.-S.
Lee, E.-S.
Lee, C.-S.
Gil, M.-G.
Kim, B.-H.
In, J.-S. ( NARAE Technology Inc. (Japan) )
Yoon, T.-B.
Kim, J.-S.
4 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4689
Pub. Year:
2002
Vol.:
Part Two
Page(from):
919
Page(to):
926
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
Language:
English
Call no.:
P63600/4689
Type:
Conference Proceedings

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