Compact formulation of mask error factor for critical dimension control in optical lithography

Compact formulation of mask error factor for critical dimension control in optical lithography

Author(s):

Zhang, H. ( Univ. of California/Berkeley (USA) )
Cain, J.P.
Spanos, C.J.

Publication title:

Metrology, Inspection, and Process Control for Microlithography XVI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4689

Pub. Year:

2002

Vol.:

Part One

Page(from):

462

Page(to):

465

Pages:

4

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444356 [0819444359]

Language:

English

Call no.:

P63600/4689

Type:

Conference Proceedings

Details

TDL ID:	ZA00012521
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Metrology, inspection, and process control for microlithography
Conf. info. (Number):	2002 : 16th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.04-2002.03.07

Similar Items:

1 Conference Proceedings Optimum sampling for characterization of systematic variation in photolithography Cain, J.P., Zhang, H., Spanos, C.J. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Across-wafer CD uniformity control through lithography and etch process: experimental verification Q. Zhang, C. Tang, J. Cain, A. Hui, T. Hsieh, N. Maccrae, B. Singh, K. Poolla, C. J. Spanos SPIE - The International Society of Optical Engineering
2 Conference Proceedings Mask critical dimension error on optical lithography Eom,T.-S., Koo,S.-S., Paek,S.-W., Kim,H.-B., Ahn,C.-N., Baik,K.-H. SPIE - The International Society for Optical Engineering	8 Conference Proceedings Characterizing post-exposure bake processing for transient- and stedy-state conditions in the context of critical dimension control Steele, D.A., Coniglio, A., Tang, C., Singh, B., Nip, S., Spanos, C.J. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Electrical linewidth metrology for systematic CD variation characterization and causal analysis Cain, J.P., Spanos, C.J. SPIE-The International Society for Optical Engineering	9 Conference Proceedings Lihtography process optimization for 130-nm polygate mask and the impact of mask error factor Hsu,S., Shi,X., Socha,R.J., Chen,J.F., Yee,J.C., Anath,M., Desai,S., Imamura,P.H., Sherrill,M.J., Tseng,Y.C., … SPIE-The International Society for Optical Engineering
4 Conference Proceedings Mask error enhancement factor for sub-0.13-μm lithography Tan,S.K., Lin,Q., Quan,C., Tay,C.J., See,A. SPIE-The International Society for Optical Engineering	10 Conference Proceedings Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process [5853-61] Chang, Y. Y., Wu, Y.-H., Shih, C.-L., Lin, J., Kan, F. SPIE - The International Society of Optical Engineering
5 Conference Proceedings BEOL process technology based on proximity electron lithography: demonstration of the via-chain yield comparable with ArF lithography Cain, J. P., Naulleau, P., Spanos, C. J. SPIE - The International Society of Optical Engineering	11 Conference Proceedings CD control of low-k-factor step-and-scan lithography Ausschnitt,C.P., Progler,C.J., Chu,W. SPIE-The International Society for Optical Engineering
6 Conference Proceedings In-situ metrology for deep-ultraviolet lithography process control Jakatdar,N.H., Niu,X., Musacchio,J.T., Spanos,C.J. SPIE-The International Society for Optical Engineering	12 Conference Proceedings Deep-ultraviolet lithography simulator tuning by resist profile matching Niu,X., Jakatdar,N.H., Spanos,C.J. SPIE - The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12