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Comparison of measured optical image profiles of silicon lines with two different theoretical models

Author(s):
Silver, R.M. ( National Institute of Standards and Technology (USA) )
Attota, R.
Stocker, M.
Jun, J.J.
Marx, E.
Larrabee, R.D.
Russo, B. ( International SEMATECH (USA) )
Davidson, M.P. ( Spectel Research Corp. (USA) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4689
Pub. Year:
2002
Vol.:
Part One
Page(from):
409
Page(to):
429
Pages:
21
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
Language:
English
Call no.:
P63600/4689
Type:
Conference Proceedings

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