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Overlay accuracy in 0.18-μm copper dual-damascene process

Author(s):
Schulz, B. ( AMD Saxony Manufacturing GmbH (Germany) )
Levinson, H.J. ( Advanced Micro Devices, Inc. (USA) )
Seltmann, R. ( AMD Saxony Manufacturing GmbH (Germany) )
Seligson, J.L. ( KLA-Tencor Corp. (Israel) )
Izikson, P.
Ronen, A.
1 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4689
Pub. Year:
2002
Vol.:
Part One
Page(from):
386
Page(to):
396
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
Language:
English
Call no.:
P63600/4689
Type:
Conference Proceedings

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