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Overlay metrology results on leading-edge Cu processes

Author(s):
Vachellerie, V. ( STMicroelectronics (France) )
Ristoiu, D.
Deleporte, A.G.
Sassoulas, P.-O.
Spinelli, P.
Poulingue, M. ( Schlumberger Semiconductor Solutions Europe (France) )
Fabre, P.
Arendt, R. ( Schlumberger Semiconductor Solutions Europe (Germany) )
Sundaram, G. ( Schlumberger Semiconductor Solutions (USA) )
Knutrud, P.C.
5 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4689
Pub. Year:
2002
Vol.:
Part One
Page(from):
223
Page(to):
236
Pages:
14
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
Language:
English
Call no.:
P63600/4689
Type:
Conference Proceedings

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