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CD reference materials for sub-10th μm applications

Author(s):
Cresswell, M.W. ( National Institute of Standards and Technology (USA) )
Bogardus, E.H. ( International SEMATECH (USA) )
de Pinillos, J.V.M. ( National Institute of Standards and Technology (USA) )
Bennett, M.H. ( International SEMATECH (USA) )
Allen, R.A. ( National Institute of Standards and Technology (USA) )
Guthrie, W.F.
Murabito, C.E.
am Ende, B.A.
Linholm, L.W.
4 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4689
Pub. date:
2002
Vol.:
Part One
Page(from):
116
Page(to):
127
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
Language:
English
Call no.:
P63600/4689
Type:
Conference Proceedings

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