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Carbon nanotube scanning probe for surface profiling of DUV and 193-nm photoresist pattern

Author(s):
Nguyen, C.V. ( NASA Ames Research Ctr. (USA) )
Stevens, R.M.D.
Barber, J.
Han, J.
Meyyappan, M.
Sanchez, M.I. ( IBM Almaden Research Ctr. (USA) )
Larson, C.E.
Hinsberg, W.D.
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XVI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4689
Pub. Year:
2002
Vol.:
Part One
Page(from):
58
Page(to):
62
Pages:
5
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444356 [0819444359]
Language:
English
Call no.:
P63600/4689
Type:
Conference Proceedings

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