Electron-beam lithography of isolated trenches with chemically amplified positive resist
- Author(s):
Eckert, A.R. ( Seagate Research (USA) ) Bojko, R.J. Gentile, H. Harris, R. Jayashankar, J. Johns, E. Minor, K. Mountfield, K. Seiler, C. Yang, X.M. - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 878
- Page(to):
- 887
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
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