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Electron-beam lithography of isolated trenches with chemically amplified positive resist

Author(s):
Eckert, A.R. ( Seagate Research (USA) )
Bojko, R.J.
Gentile, H.
Harris, R.
Jayashankar, J.
Johns, E.
Minor, K.
Mountfield, K.
Seiler, C.
Yang, X.M.
5 more
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. Year:
2002
Vol.:
Part Two
Page(from):
878
Page(to):
887
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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