Vendor capability for low-thermal-expansion mask substrates for EUV lithography
- Author(s):
Blaedel, K.L. ( Lawrence Livermore National Lab. (USA) ) Taylor, J.S. Hector, S.D. ( Motorola (USA) ) Yan, P.Y. ( Intel Corp. (USA) ) Ramamoorthy, A. Brooker, P.D. ( International SEMATECH (USA) ) - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part Two
- Page(from):
- 767
- Page(to):
- 778
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
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