Large-field ion optics for projection and proximity printing and for maskless lithography (MLZ) | 東京工業大学附属図書館文献データベース

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Large-field ion optics for projection and proximity printing and for maskless lithography (MLZ)

Author(s):

Loeschner, H. ( Ionen Mikrofabrikations System GmbH (Austria) )

Platzgummer, E.

de Jager, P.W.H. ( TNO Institute of Applied Physics (Netherlands) )

Kaesmaier, R. ( Infineon Technologies AG (Germany) )

Dietzel, A. ( IBM Storage Technology Div. (Germany) )

Terris, B.D. ( IBM Almaden Research Ctr. (USA) )

Bruenger, W.H. ( Fraunhofer Institute for Silicon Technology (Germany) )

Adam, D. ( Leica Microsystems Lithography GmbH (Germany) )

Springer, R. ( Institut fuer Mikroelektronik Stuttgart (Germany) )

Ruchhoeft, P. ( Univ. of Houston (USA) )

Publication title:

Emerging Lithographic Technologies VI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4688

Pub. Year:

2002

Vol.:

Part Two

Page(from):

595

Page(to):

606

Pages:

12

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

Language:

English

Call no.:

P63600/4688

Type:

Conference Proceedings

Details

TDL ID:	ZA00012520
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2002 : 6th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.07

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