Analysis of critical parameters for EPL mask fabrication (Invited Paper)

Analysis of critical parameters for EPL mask fabrication (Invited Paper)

Author(s):: Lercel, M.J. ( IBM Microelectronics Div. (USA) )
Publication title:: Emerging Lithographic Technologies VI
Title of ser.:: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:: 4688
Pub. Year:: 2002
Vol.:: Part Two
Page(from):: 570
Page(to):: 582
Pages:: 13
Pub. info.:: Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819444349 [0819444340]
Language:: English
Call no.:: P63600/4688
Type:: Conference Proceedings

Details

TDL ID:	ZA00012520
Series ID:	PA00000029
Conf. info. (Name):	SPIE Advanced Lithography : Emerging lithographic technologies
Conf. info. (Number):	2002 : 6th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.07

Similar Items:

1 Conference Proceedings EPL mask fabrication Lercel, M.J., Williams, C.T., Lawliss, M., Ackel, R., Kindt, L., Fisch, E. SPIE-The International Society for Optical Engineering	7 Conference Proceedings Image size control in next generation lithography masks Lercel,M.J., Magg,C. SPIE - The International Society for Optical Engineering
2 Conference Proceedings Reduction of image placement errors in EPL masks (Invited Paper) II, O.R.W., Reu, P.L., Engelstad, R.L., Lovell, E.G., Lercel, M.J., Thiel, C.W., Lawliss, M.S., Mackay, R.S. SPIE-The International Society for Optical Engineering	8 Conference Proceedings Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication Magg,C., Lercel,M.J., Lawliss,M., Kwong,R.W., Huang,W.-S., Angelopoulos,M. SPIE-The International Society for Optical Engineering
3 Conference Proceedings Chemically amplified resists for electron-beam projection lithography mask fabrication Magg,C., Lercel,M.J. SPIE - The International Society for Optical Engineering	9 Conference Proceedings Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC Racette, K.C., Williams, C.T., Fisch, E., Kindt, L., Lawliss, M., Ackel, R., Lercel, M.J. SPIE-The International Society for Optical Engineering
4 Conference Proceedings Ultrathin-membrane EPL masks (Invited Paper) Greschner, J., Bayer, T., Kalt, S., Weiss, H., Reu, P.L., Engelstad, R.L., Wood II, O.R., Thiel, C.M., Gordon, M.S., … SPIE-The International Society for Optical Engineering	10 Conference Proceedings UVN2-negative chemically amplified resist optimization for x-ray mask fabrication Rocque,J.M., Lercel,M.J., Brooks,C.J., Henry,R.W., Benoit,D.E. SPIE - The International Society for Optical Engineering
5 Conference Proceedings EUVL mask fabrication for the 45-nm node Fisch, E., Kindt, L., Lercel, M.J., Racette, K.C., Williams, C.T. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Fabrication and commercialization of scalpel masks (Invited Paper) Novenber,A.E., Peabody,M.L., Blakey,M.I., Farrow,R.C., Kasica,R.J., Liddle,J.A., Saunders,T.E., Tennant,D.M. SPIE-The International Society for Optical Engineering
6 Conference Proceedings Advanced refractory-metal and process technology for the fabrication of x-ray masks Brooks,C.J., Racette,K.C., Lercel,M.J., Powers,L.A., Benoit,D.E. SPIE - The International Society for Optical Engineering	12 Conference Proceedings The magic of 4X mask reduction [6281-51] Lercel, M. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12