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Predicting overlay performance for electron projection lithography masks

Author(s):
Reu, P.L. ( Univ. of Wisconsin/Madison (USA) )
Chen, C.-F.
Engelstad, R.L.
Lovell, E.G.
Lercel, M.J. ( IBM Microelectronics Div. (USA) )
Wood, O.R., II ( International SEMATECH (USA) )
Mackay, R.S.
2 more
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. Year:
2002
Vol.:
Part Two
Page(from):
547
Page(to):
558
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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