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PREVAIL: latest electron optics results

Author(s):
Pfeiffer, H.C. ( IBM Microelectronics Div. (USA) )
Golladay, S.D.
Gordon, M.S.
Kendall, R.A.
Lieberman, J.E.
Rockrohr, J.D.
Stickel, W.
Yamaguchi, T. ( Nikon Corp. (Japan) )
Okamoto, K.
Umemoto, T.
Shimizu, H.
Kojima, S.
Hamashima, M.
8 more
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. Year:
2002
Vol.:
Part Two
Page(from):
535
Page(to):
546
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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