Thermal expansion behavior of proposed EUVL substrate materials

Thermal expansion behavior of proposed EUVL substrate materials

Author(s):

Mitra, I. ( Schott Glas (Germany) )

Davis, M.J. ( Schott Glass Technologies (USA) )

Alkemper, J. ( Schott Glas (Germany) )

Mueller, R.

Kohlmann, H.

Aschke, L. ( Schott Lithotec AG (Germany) )

Moersen, E.

Ritter, S. ( Schott Glas (Germany) )

Hack, H.

Pannhorst, W.

5 more

Publication title:

Emerging Lithographic Technologies VI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4688

Pub. Year:

2002

Vol.:

Part One

Page(from):

462

Page(to):

468

Pages:

7

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

Language:

English

Call no.:

P63600/4688

Type:

Conference Proceedings

Details

TDL ID:	ZA00012519
Series ID:	PA00000029
Conf. info. (Name):	Emerging lithographic technologies
Conf. info. (Number):	2002 : 6th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.07

Similar Items:

1 Conference Proceedings Thermal expansion and internal quality of a proposed EUVL mask substrate material: Zerodur Davis,M.J., Marker Ⅲ,A.J., Aschke,L., Schubert,F., Moersen,E., Kohlmann,H., Mitra,I., Alkemper,J., Muller,R.W., … SPIE-The International Society for Optical Engineering	7 Conference Proceedings Production of low-thermal-expansion EUVL mask blanks with low-defect multilayer, buffer, and absorber Sobel, F., Aschke, L., Rueggeberg, F., Seitz, H., Olschewski, N., Reichhardt, T., Becker, H., Renno, M., Kirchner, S., … SPIE - The International Society of Optical Engineering
2 Conference Proceedings Optimized glass-ceramic substrate materials for EUVL applications Mitra, I., Alkemper, J., Mueller, R., Nolte, U., Engel, A., Hack, H., Kohlmann, H., Wittmer, V., Pannhorst, W., Davis, … SPIE - The International Society of Optical Engineering	8 Conference Proceedings Low thermal expansion substrate material for EUVL components application Scholze, F., Laubis, C., Buchholz, C., Fischer, A., Ploger, S., Scholz, F., Wagner, H., Ulm, G. SPIE - The International Society of Optical Engineering
3 Conference Proceedings Improved materials meeting the demands for EUV substrates Mitra, I., Alkemper, J., Nolte, U., Engel, A., Mueller, R., Ritter, S., Hack, H., Megges, K., Kohlmann, H., Pannhorst, … SPIE-The International Society for Optical Engineering	9 Conference Proceedings Update on the EUVL mask blank activity at Schott Lithotec Sobel, F., Aschke, L., Becker, H.W., Renno, M., Ruggeberg, F., Kirchner, S., Leutbecher, T., Olschewski, N., Schiffler, … SPIE - The International Society of Optical Engineering
4 Conference Proceedings Production challenges of making an EUV mask blank(Invited Paper) Aschke, L., Becker, H. W., Friemel, F., Leutbecher, T., Olschewski, N., Renno, M., Ruggeberg, F., Schiffler, M., … SPIE - The International Society of Optical Engineering	10 Conference Proceedings 100-picometer interferometry for EUVL Sommargren, G.E., Phillion, D.W., Johnson, M.A., Nguyen, N.Q., Barty, A., Snell, F.J., Dillon, D.R., Bradsher, L.S. SPIE-The International Society for Optical Engineering
5 Conference Proceedings Cleaning of low thermanl expansion materials for low-defect EUVL mask substrates Krueger-Velthusen, E., Friemel, F., Aschke, L., Lenzen, F. SPIE-The International Society for Optical Engineering	11 Conference Proceedings Low-thermal expansion material for EUVL photomask substrate application Nakajima, K., Kawasaki, N., Nakajima, T. SPIE - The International Society of Optical Engineering
6 Conference Proceedings EUVL printing results of a low-thermal expansion material(LTEM)mask Tong,W.M., Taylor,J.S., Hector,S.D., Shell,M.M., Zhang,G., Kearney,P.A., Walton,C.C., Larson,C., Wasson,J.R., … SPIE - The International Society for Optical Engineering	12 Conference Proceedings Enhanced Enzyme Activities on Hydrated Lignocellulosic Substrates Kohlmann, K. L., Sarikaya, A., Westgate, P. J., Weil, J., Velayudhan, A., Hendrickson, R., Ladisch, M. R. American Chemical Society

1

2

3

4

5

6

7

8

9

10

11

12