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EUV photoresist performance results from the VNL and the EUV LLC

Author(s):
Cobb, J.L. ( Motorola (USA) )
Dentinger, P.M. ( Sandia National Labs. (USA) )
Hunter, L.L.
O'Connell, D.J.
Gallatin, G.M. ( IBM Thomas J. Watson Research Ctr. (USA) )
Hinsberg, W.D. ( IBM Almaden Research Ctr. (USA) )
Houle, F.A.
Sanchez, M.I.
Domke, W.-D. ( Infineon Technologies AG (Germany) )
Wurm, S. ( Infineon Technologies Corp (USA) )
Okoroanyanwu, U. ( Advanced Micro Devices, Inc. (USA) )
Lee, S.H. ( Intel Corp. (USA) )
7 more
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. Year:
2002
Vol.:
Part One
Page(from):
412
Page(to):
420
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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