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REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology

Author(s):
Baik, K.-H. ( Etec Systems ,Inc. (USA) )
Dean, R.L.
Mueller, M.
Lu, M.
Lem, H.Y.
Osborne, S.
Abboud, F.E.
2 more
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. Year:
2002
Vol.:
Part One
Page(from):
401
Page(to):
411
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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