REAP (raster e-beam advanced process) using 50-kV raster e-beam system for sub-100-nm node mask technology
- Author(s):
Baik, K.-H. ( Etec Systems ,Inc. (USA) ) Dean, R.L. Mueller, M. Lu, M. Lem, H.Y. Osborne, S. Abboud, F.E. - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 401
- Page(to):
- 411
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
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