EUVL mask blank repair
- Author(s):
Barty, A. ( Lawrence Livermore National Lab. (USA) ) Mirkarimi, P.B. Stearns, D.G. Sweeney, D.W. Chapman, H.N. Clift, M. ( Sandia National Labs. (USA) ) Hector, S.D. ( Motorola (USA) ) Yi, M. ( Lawrence Berkeley National Lab. (USA) ) - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 385
- Page(to):
- 394
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
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