Inspection of EUV reticles
- Author(s):
Pettibone, D.W. ( KLA-Tencor Corp. (USA) ) Veldman, A. Liang, T. ( Intel Corp. (USA) ) Stivers, A.R. Mangat, P.J. ( Motorola (USA) ) Lu, B. Hector, S.D. Wasson, J.R. Bleadel, K.L. ( Lawrence Livermore National Lab. (USA) ) Fisch, E. ( Mask Ctr. of Competency/Photronics (USA) ) Walker, D.M. - Publication title:
- Emerging Lithographic Technologies VI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4688
- Pub. Year:
- 2002
- Vol.:
- Part One
- Page(from):
- 363
- Page(to):
- 374
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444349 [0819444340]
- Language:
- English
- Call no.:
- P63600/4688
- Type:
- Conference Proceedings
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