High-power laser-produced-plasma EUV source

High-power laser-produced-plasma EUV source

Author(s):

Ballard, W.P. ( Sandia National Labs. (USA) )

Shields, H. ( TRW, Inc. (USA) )

Petach, M.B.

Pierre, R.J.St. ( Cutting Edge Optronics, Inc. (USA) )

Bristol, R.L. ( Intel Corp. (USA) )

5 more

Publication title:

Emerging Lithographic Technologies VI

Title of ser.:

Proceedings of SPIE - the International Society for Optical Engineering

Ser. no.:

4688

Pub. Year:

2002

Vol.:

Part One

Page(from):

302

Page(to):

309

Pages:

8

Pub. info.:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444349 [0819444340]

Language:

English

Call no.:

P63600/4688

Type:

Conference Proceedings

Details

TDL ID:	ZA00012519
Series ID:	PA00000029
Conf. info. (Name):	Emerging lithographic technologies
Conf. info. (Number):	2002 : 6th
Conf. info. (Venue):	Santa Clara, CA, USA
Conf. info. (Date):	2002.03.05-2002.03.07

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