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Lithographic evaluation of the EUV engineering test stand

Author(s):
Lee, S.H. ( Intel Corp. (USA) )
Tichenor, D.A. ( Sandia National Labs. (USA) )
Ballard, W.P. ( Intel Corp. (USA) )
Bernardez, L.J, II. ( Sandia National Labs. (USA) )
Goldsmith, J.E.M.
Haney, S.J.
Jefferson, K.L.
Johnson, T.A.
Leung, A.H.
O'Connell, D.J.
Replogle, W.C.
Wronosky, J.B.
Blaedel, K.L. ( Lawrence Livermore National Lab. (USA) )
Naulleau, P.P. ( Lawrence Berkeley National Lab. (USA) )
Goldberg, K.A.
Gullikson, E.M.
Chapman, H.N.
Wurm, S. ( Infineon Technologies Corp. (USA) )
Panning, E.M. ( Intel Corp. (USA) )
Yan, P.-Y.
Zhang, G.
Bjorkholm, J.E.
Kubiak, G.D. ( Sandia National Labs. (USA) )
Sweeney, D.W. ( Lawrence Livermore National Lab. (USA) )
Attwood, D.T. ( Lawrence Berkeley National Lab. (USA) )
Gwyn, C.W. ( Intel Corp. (USA) )
21 more
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. Year:
2002
Vol.:
Part One
Page(from):
266
Page(to):
276
Pages:
11
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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