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Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC

Author(s):
Racette, K.C. ( IBM Microelectronics Div. (USA) )
Williams, C.T.
Fisch, E.
Kindt, L.
Lawliss, M.
Ackel, R.
Lercel, M.J.
2 more
Publication title:
Emerging Lithographic Technologies VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
4688
Pub. date:
2002
Vol.:
Part One
Page(from):
161
Page(to):
172
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444349 [0819444340]
Language:
English
Call no.:
P63600/4688
Type:
Conference Proceedings

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